Incredibly Superior purity silicon for semiconductors is obtained using the Siemens procedure; the silicon is reacted to create trichlorosilane, and that is to start with purified by distillation, then reacted with purified hydrogen on high purity silicon rods at 1150 oC to yield higher purity, polycrystalline silicon with hydrochloric acid https://reidlljif.ttblogs.com/16058241/5-simple-statements-about-silica-carbide-grit-explained